Carl Zeiss and Synopsys Collaborate on In-Die Registration Metrology for Photomask Manufacturing

Carl Zeiss SMS GmbH, a leading supplier for photomask metrology and repair tools and Synopsys, Inc., a world leader in software and IP for semiconductor design, verification and manufacturing, today announced a collaboration to support the ZEISS tool family for in-die metrology solutions for the 32-nanometer technology node and below.

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