Imec today reports promising results in its Extreme Ultraviolet Lithography (EUV) mask cleaning program for defect-free EUV masks which are crucial in achieving high chip manufacturing yield.
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- Julian Wess Award for outstanding achievements in elementary particle and astroparticle physics [Last Updated On: December 13th, 2009] [Originally Added On: December 13th, 2009]
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- National Institute of Standards and Technology invests up to $71 million in new manufacturing, infrastructure research and development [Last Updated On: December 16th, 2009] [Originally Added On: December 16th, 2009]
- Southwest Nanotechnologies Recieves Two Prestigious Research Grants To Deveop A New Generation of Carbon Nanotubes [Last Updated On: December 16th, 2009] [Originally Added On: December 16th, 2009]
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