SEMATECH and ASML Form Partnership at UAlbany NanoCollege to Tackle Crucial EUVL Challenge

As a member of the Lithography program, ASML will team with researchers at SEMATECH to advance EUV (extreme ultraviolet) lithography technology and its associate infrastructure components, including mask defect reduction, mask metrology infrastructure, source development, resist and materials development, and overall manufacturability and extendibility.

Hologramme aus dem Nanokosmos

Eine Arbeitsgruppe des Sonderforschungsbereichs 688 in Zusammenarbeit mit Wissenschaftlern vom DESY in Hamburg und der ESRF in Grenoble hat kuerzlich das erste voll funktionsfaehige Mikroskop fuer die Holografie von Nanostrukturen vorgestellt.

Spinning kilometers-long, multi-layered carbon nanotube yarns

Materials engineers are keen to exploit the outstanding mechanical properties of carbon nanotubes for applications in fibers, composites, fabrics and other larger-scale structures and devices. The ability to fabricate continuous, multifunctional yarns represents an important step in this direction. The development of a continuous, weavable multilayered CNT yarn with superior mechanical, structural, surface, and electrical properties would open the way for a wide range of structural and functional applications, including composites, intelligent fabrics, catalyst supports, and sensors. Researchers in China now demonstrate the fabrication of a novel continuous yarn of CNTs with a multiple-layer structure by a CVD spinning process. The yarn consists of multiple monolayers of CNTs concentrically assembled in seamless tubules along the yarn axis.