AIXTRON AG today announced an order for its QXP-8300 ALD deposition tool from a major Taiwanese foundry. The order is for a 300MM system for the deposition of next generation high-k materials by Atomic Layer Deposition (ALD).
Monthly Archives: July 2010
Bayer MaterialScience Joins Holst Centre Flexible Electronics Research
Bayer MaterialScience AG and Holst Centre, an open-innovation initiative by research organizations IMEC (Belgium) and TNO (The Netherlands), have now announced their partnership in the field of flexible electronics. By joining the Holst Centre eco-system, Bayer exchanges its own expertise with the existing network of academic and industrial partners.
NanoSight Holds First European Users Meeting on Nanoparticle Characterization
NanoSight, world-leading manufacturers of unique nanoparticle characterization technology, together with distributor partners Schaefer Technologie, have recently held a meeting of users of their successful range of nanoparticle tracking analysis instruments in Langen, Germany.
Linkam Supplies Temperature Stages to Liquid Crystal Development and Characterization Specialists, LC-Vision
Market leaders in temperature controlled microscopy, Linkam Scientific Instruments, teams up to supply stages to LC-Vision, suppliers of state-of-the-art turnkey systems for high throughput automated liquid crystal analysis.
Observation of atomic processes identifies how fullerenes push their way under graphene surfaces
HZB researchers observe atomic processes while doping semicon-ductor materials.
Midatech and Immunotope Form Joint Venture, Syntara LLC, for the Development of Immune Therapies
Midatech Group Ltd., a global leader for the design, development, synthesis and manufacture of nanomedicines, and Immunotope Inc, a biotechnology company focused on the development of immunotherapy products, today announced the formation of a joint venture Syntara LLC, to develop antigen based products for immune therapies to treat chronic viral infections and certain cancers.
Alchimer Secures Funding from Panasonic to Commercialize Nanoscale Deposition Technology
Panasonic recognizes the potential of Alchimer's groundbreaking technology for depositing nanometric films used in IC interconnects and 3D through-silicon vias. Its investment arm, Pansonic Venture Group, recently invested in Alchimer.
SolRayo Utilizes NSF Grant to Develop New Nanomaterials for Commercial Use
SolRayo is developing new nanoparticle-based materials for commercial use in various renewable energy, industrial, consumer and automotive applications. The objective of the awarded grant is to address an issue concerning the degradation of performance of certain lithium batteries, particularly in high temperature applications.
Nanomaterials in the construction industry and resulting health and safety issues
Tailing after emerging nanotechnology applications in biomedical and electronic industries, the construction industry recently started seeking out a way to advance conventional construction materials using a variety of manufactured nanomaterials. The use of nanotechnology materials and applications in the construction industry should be considered not only for enhancing material properties and functions but also in the context of energy conservation. This is a particularly important prospect since a high percentage of all energy used (e.g., 41% in the United States) is consumed by commercial buildings and residential houses by applications such as heating, lighting, and air conditioning. A recent review by scientists at Rice University has looked at the benefits of using nanomaterials in construction materials but also highlights the potentially harmful aspects of releasing nanomaterials into the environment.
NXP and Applied Materials Sign Comprehensive Service Contract
Applied Materials, Inc. today announced that it has signed a comprehensive, five-year contract to service all Applied Materials chip production equipment at NXP Semiconductor's facility in Nijmegen, Holland.
Applied Materials to Highlight Innovations for Enabling Future Electronic Devices
Applied Materials, Inc. will showcase its leadership and innovation for producing future generations of microchips and clean energy solutions at the Semicon West 2010, Intersolar North America and ASMC (Advanced Semiconductor Manufacturing Conference) events in San Francisco this week.
Global Semiconductor Alliance Supports Europe Start-Ups and Key Enabling Technologies
Awareness campaign emphasizes global opportunities for the European semiconductor industry.
Semiconductor Research Corporation creates industry and university collaboration for energy research
New initiative dedicated to enabling reliable, affordable, energy-efficient systems.
Nanotechnology-based personal care products and brands on the rise
The new report 'Can Nanotech Unlock the Fountain of Youth?', finds that the beauty industry has begun to make an aggressive foray into nanotechnology, using tiny molecular compounds to improve the performance of creams, sunscreens, shampoos and other personal-care products.
SUSS MicroTec Launches MaskTrack Pro Bake/Develop for Next Generation Lithography
Today, HamaTech APE GmbH introduced the latest addition to its Next Generation Lithography line of mask integrity platforms, the MaskTrack Pro Bake/Develop (BD). The product addresses the challenges of mask manufacturing of advanced 193i Optical Immersion and Extreme Ultraviolet Lithography (EUVL).
Crossing Automation Receives First Order for ExpressConnect Integrated Atmospheric and Vacuum Wafer-level Automation System
Crossing Automation, Inc., a leading supplier of efficient, cost-effective front-end and back-end automation solutions and engineering services to high volume semiconductor equipment manufacturers, today announced that it has received an order for its ExpressConnect integrated automation platform.
Imec and ASML Demonstrate Potential of 193nm Immersion Lithography With Freeform Illumination
Imec and ASML collaborated to qualify ASML's Tachyon Source Mask Optimization and programmable illuminator system FlexRay, proving its potential with the demonstration of a 22nm SRAM memory cell.
EUV mask cleaning program on track towards EUV mass manufacturing
Imec today reports promising results in its Extreme Ultraviolet Lithography (EUV) mask cleaning program for defect-free EUV masks which are crucial in achieving high chip manufacturing yield.
Imec reports breakthrough in narrow pitch interconnects
Imec sets major step towards 20nm half pitch interconnects with the realization of electrically functional copper lines embedded into silicon oxide using a spacer-defined double patterning approach.
Record efficiencies for large-area epitaxial thin-film silicon solar cells
Imec realized large-area (70cm2) epitaxial solar cells with efficiencies of up to 16.3% on high-quality substrates. And efficiencies of up to 14.7% were achieved on large-area low-quality substrates, showing the potential of thin-film epitaxial solar cells for industrial manufacturing.