{"id":141279,"date":"2014-09-12T13:50:31","date_gmt":"2014-09-12T17:50:31","guid":{"rendered":"http:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/uncategorized\/euv-not-needed-at-10-or-7nm-says-intel.php"},"modified":"2014-09-12T13:50:31","modified_gmt":"2014-09-12T17:50:31","slug":"euv-not-needed-at-10-or-7nm-says-intel","status":"publish","type":"post","link":"https:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/moores-law\/euv-not-needed-at-10-or-7nm-says-intel.php","title":{"rendered":"EUV not needed at 10 or 7nm, says Intel"},"content":{"rendered":"<p><p>    September 12, 2014 \/\/ By Rick Merritt  <\/p>\n<p>    Intel believes it can drive Moores Law down to 7 nm even    without long-delayed advances in lithography.  <\/p>\n<p>    Page 1 of 3  <\/p>\n<p>    My day job is working on [research for a process to make] 7 nm    [chips and] I believe there is a way without EUV, said Intel    fellow Mark Bohr, responding to a question after a talk on    Intels new 14 nm process.  <\/p>\n<p>    The optimism is significant given the core lithography used for    patterning chips hasnt had an upgrade in more than a decade.    Chipmakers generally dont expect the much-delayed extreme    ultraviolet (EUV) lithography in time for 10 nm chips, but many    still hold out hopes it could be ready for a 7 nm generation.  <\/p>\n<p>    I am very interested in EUV [because it] could really help    scaling and perhaps process simplification, reducing three or    four masks to one in some cases, Bohr said. Unfortunately,    its not ready yet -- the throughput and reliability are not    there.  <\/p>\n<p>    Bohr did not give any hints about how Intel will make 7 or even    10 nm chips without EUV. However he did note at 14 nm Intel is    using triple patterning on one or more critical layers.  <\/p>\n<p>    Although wafer costs rose at an accelerating rate for the last    two nodes due to the need for more masks, Intel continues to    pack more transistors in a given area of silicon. The density    offsets wafer costs, leading to the cost-per-transistor    decline, Bohr said in his talk on Intels 14 nm process.  <\/p>\n<p>    One of the fundamental benefits of Moores Law is smaller    feature sizes, primarily to get lower cost per transistor so we    can do more things in a similarly sized chip, he said.  <\/p>\n<p>    Intel already announced it has started making in volume chips    using a 14 nm process at a lower cost per transistor than its    prior 22 nm generation. It also said it is in development of a    10 nm process that it believes will deliver lower cost per    transistor.  <\/p>\n<p><!-- Auto Generated --><\/p>\n<p>Read this article: <\/p>\n<p><a target=\"_blank\" href=\"http:\/\/www.electronics-eetimes.com\/en\/euv-not-needed-at-10-or-7nm-says-intel.html?news_id=222922346&cmp_id=7\/RK=0\/RS=plrbJj6CQ_KkPA1URbQbv7NC5VI-\" title=\"EUV not needed at 10 or 7nm, says Intel\">EUV not needed at 10 or 7nm, says Intel<\/a><\/p>\n","protected":false},"excerpt":{"rendered":"<p> September 12, 2014 \/\/ By Rick Merritt Intel believes it can drive Moores Law down to 7 nm even without long-delayed advances in lithography. Page 1 of 3 My day job is working on [research for a process to make] 7 nm [chips and] I believe there is a way without EUV, said Intel fellow Mark Bohr, responding to a question after a talk on Intels new 14 nm process.  <a href=\"https:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/moores-law\/euv-not-needed-at-10-or-7nm-says-intel.php\">Continue reading <span class=\"meta-nav\">&rarr;<\/span><\/a><\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"limit_modified_date":"","last_modified_date":"","_lmt_disableupdate":"","_lmt_disable":"","footnotes":""},"categories":[14],"tags":[],"class_list":["post-141279","post","type-post","status-publish","format-standard","hentry","category-moores-law"],"modified_by":null,"_links":{"self":[{"href":"https:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/wp-json\/wp\/v2\/posts\/141279"}],"collection":[{"href":"https:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/wp-json\/wp\/v2\/comments?post=141279"}],"version-history":[{"count":0,"href":"https:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/wp-json\/wp\/v2\/posts\/141279\/revisions"}],"wp:attachment":[{"href":"https:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/wp-json\/wp\/v2\/media?parent=141279"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/wp-json\/wp\/v2\/categories?post=141279"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/www.euvolution.com\/futurist-transhuman-news-blog\/wp-json\/wp\/v2\/tags?post=141279"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}